Nanoparticle engineering for chemical-mechanical planarization : (Record no. 3620)

MARC details
000 -LEADER
fixed length control field 03684cam a22005651i 4500
001 - CONTROL NUMBER
control field 9780429291890
003 - CONTROL NUMBER IDENTIFIER
control field FlBoTFG
005 - DATE AND TIME OF LATEST TRANSACTION
control field 20210906121106.0
006 - FIXED-LENGTH DATA ELEMENTS--ADDITIONAL MATERIAL CHARACTERISTICS
fixed length control field m d
007 - PHYSICAL DESCRIPTION FIXED FIELD--GENERAL INFORMATION
fixed length control field cr |||||||||||
008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION
fixed length control field 190510s2019 xx fo 000 0 eng
040 ## - CATALOGING SOURCE
Original cataloging agency OCoLC-P
Language of cataloging eng
Description conventions rda
Transcribing agency OCoLC-P
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781000023367
Qualifying information EPUB
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 1000023362
Qualifying information EPUB
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9780429291890
Qualifying information (electronic bk.)
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 0429291892
Qualifying information (electronic bk.)
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781000023220
Qualifying information (electronic bk. : PDF)
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 1000023222
Qualifying information (electronic bk. : PDF)
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 9781000023299
Qualifying information (electronic bk. : Mobipocket)
020 ## - INTERNATIONAL STANDARD BOOK NUMBER
International Standard Book Number 100002329X
Qualifying information (electronic bk. : Mobipocket)
024 7# - OTHER STANDARD IDENTIFIER
Standard number or code 10.1201/9780429291890
Source of number or code doi
035 ## - SYSTEM CONTROL NUMBER
System control number (OCoLC)1104036011
035 ## - SYSTEM CONTROL NUMBER
System control number (OCoLC-P)1104036011
050 #4 - LIBRARY OF CONGRESS CALL NUMBER
Classification number TK7874.84
072 #7 - SUBJECT CATEGORY CODE
Subject category code TEC
Subject category code subdivision 008070
Source bisacsh
072 #7 - SUBJECT CATEGORY CODE
Subject category code TEC
Subject category code subdivision 009010
Source bisacsh
072 #7 - SUBJECT CATEGORY CODE
Subject category code TEC
Subject category code subdivision 021000
Source bisacsh
072 #7 - SUBJECT CATEGORY CODE
Subject category code SCI
Subject category code subdivision 013060
Source bisacsh
072 #7 - SUBJECT CATEGORY CODE
Subject category code TDC
Source bicssc
082 04 - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 621.38152
Edition number 22
100 1# - MAIN ENTRY--PERSONAL NAME
Personal name Paik, Ungyu,
Relator term author
9 (RLIN) 17373
245 10 - TITLE STATEMENT
Title Nanoparticle engineering for chemical-mechanical planarization :
Remainder of title fabrication of next-generation nanodevices /
Statement of responsibility, etc. Ungyu Paik, Jea-Gun Park.
264 #1 - PRODUCTION, PUBLICATION, DISTRIBUTION, MANUFACTURE, AND COPYRIGHT NOTICE
Place of production, publication, distribution, manufacture [Place of publication not identified] :
Name of producer, publisher, distributor, manufacturer CRC Press,
Date of production, publication, distribution, manufacture, or copyright notice 2019.
300 ## - PHYSICAL DESCRIPTION
Extent 1 online resource (221 pages :
Other physical details 186 illustrations).
336 ## - CONTENT TYPE
Content type term text
Source rdacontent
337 ## - MEDIA TYPE
Media type term computer
Source rdamedia
338 ## - CARRIER TYPE
Carrier type term online resource
Source rdacarrier
520 ## - SUMMARY, ETC.
Summary, etc. In the development of next-generation nanoscale devices, higher speed and lower power operation is the name of the game. Increasing reliance on mobile computers, mobile phone, and other electronic devices demands a greater degree of speed and power. As chemical mechanical planarization (CMP) progressively becomes perceived less as black art and more as a cutting-edge technology, it is emerging as the technology for achieving higher performance devices. Nanoparticle Engineering for Chemical-Mechanical Planarization explains the physicochemical properties of nanoparticles according to each step in the CMP process, including dielectric CMP, shallow trend isolation CMP, metal CMP, poly isolation CMP, and noble metal CMP. The authors provide a detailed guide to nanoparticle engineering of novel CMP slurry for next-generation nanoscale devices below the 60nm design rule. They present design techniques using polymeric additives to improve CMP performance. The final chapter focuses on novel CMP slurry for the application to memory devices beyond 50nm technology. Most books published on CMP focus on the polishing process, equipment, and cleaning. Even though some of these books may touch on CMP slurries, the methods they cover are confined to conventional slurries and none cover them with the detail required for the development of next-generation devices. With its coverage of fundamental concepts and novel technologies, this book delivers expert insight into CMP for all current and next-generation systems.
588 ## - SOURCE OF DESCRIPTION NOTE
Source of description note OCLC-licensed vendor bibliographic record.
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Chemical mechanical planarization.
9 (RLIN) 17374
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Nanoparticles.
9 (RLIN) 17375
650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element Nanoelectronics.
9 (RLIN) 17376
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element SCIENCE / Chemistry / Industrial & Technical
Source of heading or term bisacsh
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element TECHNOLOGY / Electronics / Microelectronics
Source of heading or term bisacsh
9 (RLIN) 17377
650 #7 - SUBJECT ADDED ENTRY--TOPICAL TERM
Topical term or geographic name entry element TECHNOLOGY / Engineering / Chemical & Biochemical
Source of heading or term bisacsh
9 (RLIN) 17378
700 1# - ADDED ENTRY--PERSONAL NAME
Personal name Park, Jea-Gun.
9 (RLIN) 17379
856 40 - ELECTRONIC LOCATION AND ACCESS
Materials specified Taylor & Francis
Uniform Resource Identifier <a href="https://www.taylorfrancis.com/books/9780429291890">https://www.taylorfrancis.com/books/9780429291890</a>
856 42 - ELECTRONIC LOCATION AND ACCESS
Materials specified OCLC metadata license agreement
Uniform Resource Identifier <a href="http://www.oclc.org/content/dam/oclc/forms/terms/vbrl-201703.pdf">http://www.oclc.org/content/dam/oclc/forms/terms/vbrl-201703.pdf</a>
942 ## - ADDED ENTRY ELEMENTS (KOHA)
Koha item type E-books

No items available.